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The Olympus FV3000 is a laser scanning confocal microscope used for high-resolution imaging of fluorescent samples. It captures optical sections of samples to produce detailed three-dimensional images. This system is widely used in biological and materials imaging research.
The Talos F200i Transmission Electron Microscope provides atomic-scale imaging of materials. Electrons transmitted through ultra-thin samples reveal crystal structures, defects, and nanoscale features. This tool is essential for nanotechnology and advanced materials characterization.
The wafer bonder joins two semiconductor wafers together using pressure, heat, or adhesives. This technique is commonly used in MEMS fabrication and advanced semiconductor packaging. Wafer bonding allows the integration of multiple materials into a single device structure.
The P-Type diffusion furnace is used to introduce acceptor dopants into semiconductor substrates. This process creates p-type regions needed for transistor and diode structures. The furnace provides precise temperature control for consistent dopant diffusion.
The N-Type diffusion furnace introduces donor impurities into semiconductor materials to create n-type regions. High temperatures allow dopant atoms to diffuse into silicon wafers. This process is a fundamental step in semiconductor device fabrication.
The Rapid Thermal Annealer heats samples to high temperatures for very short time periods. This allows researchers to activate dopants or repair crystal damage without affecting the entire wafer structure. It is frequently used in semiconductor processing and materials research.
The Oxford PlasmaPro ICP/RIE system performs dry etching of materials using plasma chemistry. It combines inductively coupled plasma with reactive ion etching to provide precise control of etch rates and profiles. This tool is widely used in semiconductor pattern transfer and nanofabrication processes.
The Plasma-Enhanced Chemical Vapor Deposition system deposits thin films using plasma to activate chemical reactions in precursor gases. This process enables lower temperature deposition while maintaining high film quality. PECVD is commonly used to deposit dielectric materials such as silicon nitride and silicon dioxide.
The Plasma-Enhanced Atomic Layer Deposition (PEALD) system produces ultra-thin films one atomic layer at a time. Plasma activation allows film growth at lower temperatures compared to traditional ALD. This instrument is ideal for creating uniform coatings for nanoscale devices and semiconductor structures.
The electron beam evaporator deposits thin films by heating a source material with a focused electron beam in a vacuum chamber. The evaporated material condenses onto a substrate, forming highly pure coatings. This method is commonly used for depositing metals and high-purity materials in semiconductor fabrication.
The AJA ATC-2200 Magnetron Sputter System deposits thin films using physical vapor deposition (PVD). It uses ionized gas to eject atoms from a target material that then coat a substrate surface. Researchers use this system to create thin metal, oxide, and compound films used in microelectronics and nanotechnology.
The 3-Zone Tube Furnace is used for high-temperature thermal processing of materials under controlled atmospheric conditions. Its three independently controlled heating zones allow researchers to create uniform temperatures or gradients across samples. This instrument is commonly used for material synthesis, annealing, and diffusion experiments in semiconductor and materials science research.
PanVariants is a comprehensive pan-genome variant detection pipeline designed to identify genetic variations across diverse populations. It supports execution on both local machines and Sun Grid Engine (SGE) clusters. Leveraging pan-genome references, the tool enables high-precision detection of Single Nucleotide Variants (SNVs), INDELs INSUFFICIENT INFORMATION - WAITING FOR WORKING URL
https://matkp.org/ - this is related to cfde - make sure it is linked. From the webinar; ask Ko-Wei if there are questions about this resource. Maybe also link the webinar here
Competitive enzyme-linked immunosorbent assay (ELISA) kit for quantitative determination of testosterone concentration in serum, plasma and other biological fluids. Manufactured by ELK Biotechnology. Catalog number ELK10254.
SMIntegration is an innovative open-source platform for integrated analysis of spatial transcriptomics and metabolomics data. It integrates spatial pattern recognition, differential comparison, network construction, and functional annotation into a unified workflow. Designed to address key challenges in spatial multi-omics correlation analysis, SMIntegration enables researchers to explore gene-metabolite co-regulation mechanisms through an intuitive web interface, revealing spatial heterogeneity in tissue development and disease progression.
SeaLifeBase insufficient information
"A unique powdered blend of researched prebiotic fibers and polyphenols to support gastrointestinal, cellular, and immune function by boosting bifidobacteria and microbiome diversity‡"
Mcity is an interdisciplinary public-private partnership bringing together industry, government, and academia to transform mobility. As part of the U-M Transportation Research Institute, Mcity helps advance safe and efficient transportation and mobility solutions for the benefit of society.Mcity is a makerspace for today’s mobility and transportation innovators. We offer open-source tools, remote or on-site testing, and participation in the Mcity community—learn how to get started.Build and test mobility innovation.