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Carrier lifetime enhancement in halide perovskite via remote epitaxy.

Jie Jiang | Xin Sun | Xinchun Chen | Baiwei Wang | Zhizhong Chen | Yang Hu | Yuwei Guo | Lifu Zhang | Yuan Ma | Lei Gao | Fengshan Zheng | Lei Jin | Min Chen | Zhiwei Ma | Yuanyuan Zhou | Nitin P Padture | Kory Beach | Humberto Terrones | Yunfeng Shi | Daniel Gall | Toh-Ming Lu | Esther Wertz | Jing Feng | Jian Shi
Nature communications | 2019

Crystallographic dislocation has been well-known to be one of the major causes responsible for the unfavorable carrier dynamics in conventional semiconductor devices. Halide perovskite has exhibited promising applications in optoelectronic devices. However, how dislocation impacts its carrier dynamics in the 'defects-tolerant' halide perovskite is largely unknown. Here, via a remote epitaxy approach using polar substrates coated with graphene, we synthesize epitaxial halide perovskite with controlled dislocation density. First-principle calculations and molecular-dynamics simulations reveal weak film-substrate interaction and low density dislocation mechanism in remote epitaxy, respectively. High-resolution transmission electron microscopy, high-resolution atomic force microscopy and Cs-corrected scanning transmission electron microscopy unveil the lattice/atomic and dislocation structure of the remote epitaxial film. The controlling of dislocation density enables the unveiling of the dislocation-carrier dynamic relation in halide perovskite. The study provides an avenue to develop free-standing halide perovskite film with low dislocation density and improved carried dynamics.

Pubmed ID: 31515482

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