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Showing 20 out of 29,142 Resources on page 439

Rigaku: ZSX Primus spectrometer

Sequential WDXRF spectrometer with elemental analysis of solids, liquids, powders, alloys and thin films, from beryllium Be through uranium U

  • Resource
  • SciCrunch
  • 6 years ago - submitted by Edyta Vieth

Rigaku: ZSX Primus 400 spectrometer

Sequential WDXRF spectrometer for large samples with elemental analysis of solids, liquids, powders, alloys and thin films.

  • Resource
  • SciCrunch
  • 6 years ago - submitted by Edyta Vieth

Rigaku: ZSX Primus III spectrometer

Tube above sequential WDXRF spectrometer with elemental analysis of solids, liquids, powders, alloys and thin films,from Oxygen fhrough Uranium.

  • Resource
  • SciCrunch
  • 6 years ago - submitted by Edyta Vieth

Rigaku: XSight Micron LC

Compact 2D X ray camera with micron and sub micron resolution for imaging.

  • Resource
  • SciCrunch
  • 6 years ago - submitted by Edyta Vieth

Rigaku: XtalCheck diffractometer

Automated in situ x ray crystallography that screens protein crystals on single crystal X ray diffractometer.

  • Resource
  • SciCrunch
  • 6 years ago - submitted by Edyta Vieth

Rigaku: Xsight Micron FC

Compact 2D X ray camera for topography and imaging applications X ray and EUV detector.

  • Resource
  • SciCrunch
  • 6 years ago - submitted by Edyta Vieth

Rigaku: XtaLAB Mini II diffractometer

Benchtop single crystal x ray diffractometer.

  • Resource
  • SciCrunch
  • 6 years ago - submitted by Edyta Vieth

Rigaku: TXRF 3800e

Surface contamination metrology that measures elemental contamination at discrete points or with full wafer maps.

  • Resource
  • SciCrunch
  • 6 years ago - submitted by Edyta Vieth

Rigaku: WDA-3650 spectrometer

Simultaneous WDXRF spectrometer film thickness and composition measurements on wafers and media disks.

  • Resource
  • SciCrunch
  • 6 years ago - submitted by Edyta Vieth

Rigaku: VariMax DW

Dual wavelength Confocal Max Flux CMF optics for single crystal X ray diffraction. Focuses and monochromatizes two different X ray wavelengths for single crystal X ray diffraction applications.

  • Resource
  • SciCrunch
  • 6 years ago - submitted by Edyta Vieth

Rigaku: WaferX 310 spectrometer

In line, simultaneous WDXRF spectrometer film thickness and composition measurements on blanket wafers.

  • Resource
  • SciCrunch
  • 6 years ago - submitted by Edyta Vieth

Rigaku: TMA8311 Thermal Analyzer

Thermomechanical analyzer. Measurement of a mechanical property change with respect to temperature.

  • Resource
  • SciCrunch
  • 6 years ago - submitted by Edyta Vieth

Rigaku: UltraX 18 generator

18 kW rotating anode X-ray generator. A high powered X-ray source that can produce point or line focus X-ray beams.

  • Resource
  • SciCrunch
  • 6 years ago - submitted by Edyta Vieth

Rigaku: TXRF-V310

Wafer surface contamination metrology by VPD TXRF with measurement of ultra trace elemental surface contamination.

  • Resource
  • SciCrunch
  • 6 years ago - submitted by Edyta Vieth

Rigaku: Supermini200 spectrometer

High power benchtop sequential WDXRF spectrometer.Used for elemental analysis of solids, liquids, powders, alloys and thin films.

  • Resource
  • SciCrunch
  • 6 years ago - submitted by Edyta Vieth

Rigaku: Ultima IV diffractometer

Automated multipurpose diffractometer. Powder diffraction, thin film diffraction, SAXS, pole figure, and residual stress and in plane experiments.

  • Resource
  • SciCrunch
  • 6 years ago - submitted by Edyta Vieth

Rigaku: TXRF310Fab

Wafer surface contamination metrology by TXRF with measurement of trace elemental surface contamination.

  • Resource
  • SciCrunch
  • 6 years ago - submitted by Edyta Vieth

Rigaku: TMA/HUM Thermal Analyzer

Humidity controlled TMA.Measurement of mechanical property change with respect to temperature and humidity.

  • Resource
  • SciCrunch
  • 6 years ago - submitted by Edyta Vieth

Rigaku: STA8122 Thermal Analyzer

Simultaneous Thermal Analyzer.Measures weight changes and endothermic or exothermic reaction.

  • Resource
  • SciCrunch
  • 6 years ago - submitted by Edyta Vieth

Rigaku: TXRF 3760

Surface contamination metrology. Used to measure elemental contamination at discrete points or with full wafer maps.

  • Resource
  • SciCrunch
  • 6 years ago - submitted by Edyta Vieth