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Sequential WDXRF spectrometer with elemental analysis of solids, liquids, powders, alloys and thin films, from beryllium Be through uranium U
Sequential WDXRF spectrometer for large samples with elemental analysis of solids, liquids, powders, alloys and thin films.
Tube above sequential WDXRF spectrometer with elemental analysis of solids, liquids, powders, alloys and thin films,from Oxygen fhrough Uranium.
Compact 2D X ray camera with micron and sub micron resolution for imaging.
Automated in situ x ray crystallography that screens protein crystals on single crystal X ray diffractometer.
Compact 2D X ray camera for topography and imaging applications X ray and EUV detector.
Benchtop single crystal x ray diffractometer.
Surface contamination metrology that measures elemental contamination at discrete points or with full wafer maps.
Simultaneous WDXRF spectrometer film thickness and composition measurements on wafers and media disks.
Dual wavelength Confocal Max Flux CMF optics for single crystal X ray diffraction. Focuses and monochromatizes two different X ray wavelengths for single crystal X ray diffraction applications.
In line, simultaneous WDXRF spectrometer film thickness and composition measurements on blanket wafers.
Thermomechanical analyzer. Measurement of a mechanical property change with respect to temperature.
18 kW rotating anode X-ray generator. A high powered X-ray source that can produce point or line focus X-ray beams.
Wafer surface contamination metrology by VPD TXRF with measurement of ultra trace elemental surface contamination.
High power benchtop sequential WDXRF spectrometer.Used for elemental analysis of solids, liquids, powders, alloys and thin films.
Automated multipurpose diffractometer. Powder diffraction, thin film diffraction, SAXS, pole figure, and residual stress and in plane experiments.
Wafer surface contamination metrology by TXRF with measurement of trace elemental surface contamination.
Humidity controlled TMA.Measurement of mechanical property change with respect to temperature and humidity.
Simultaneous Thermal Analyzer.Measures weight changes and endothermic or exothermic reaction.
Surface contamination metrology. Used to measure elemental contamination at discrete points or with full wafer maps.