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Features Asylum Research performance and quality and offers high resolution imaging, supports large samples, most imaging modes, and many accessories.
Measurement system used for quantum transport measurements. In conjunction with cryogenic research tools, it offers multi channel measurements to for quantum technologies.
Features same core performance as MFP 3D Origin but includes support for complete range of innovative MFP 3D accessories.
Integrates AFM and optical microscopy for bioscience research. Bio AFM that uses AFM imaging resolution, force measurement performance, and application versatility while integrating optical techniques.
PlasmaPro 800 offers a flexible solution for Plasma Enhanced Chemical Vapour Deposition (PECVD) processes on large wafer batches and 300mm wafers, in a compact footprint, open-loading system. The large wafer platen allows for production scale batch processing and 300mm wafer handling.
Cryogenic environment controller that includes single channel 24 bit high resolution temperature measurement circuit, which supports all standard cryogenic sensors, like ruthenium oxide, cernox, silicon diodes, platinum, thermocouple and RhFe. With constant voltage mode, it enables accurate temperature measurement using negative temperature sensors down to below 250 mK.
Ion beam deposition products produce deposited films with high quality, dense and smooth surfaces. Ion beam technology provides approach to etch and deposition by offering single tool and maximising system utilisation, which includes open load, single substrate load lock, and cassette to cassette.
Magnet power supply system enables automated control of wide range of superconducting magnets, including NMR, high field, beamline and Vector Rotate magnet systems. MercuryiPS is bi polar and has high stability, four quadrant power supply with incorporated quench protection.
Large sample AFM that offers high speed imaging and extended range in single scanner. Jupiter provides complete 200 mm sample access and delivers resolution, results, and versatility for academic research and industrial R and D laboratories.
PlasmaPro 100 Polaris single wafer etch system offers solutions to produce etch results needed to maintain competitive edge, with experience of etching materials such as GaN, SiC and Sapphire.
Ion beam etch and deposition system is used for high quality material processing. Systems have flexible hardware options including open load, single substrate load lock, and cassette to cassette.
Ion beam etch offers flexibility coupled with uniformity and is suitable for wide range of applications. Systems have flexible hardware options including open load, single substrate load lock and cassette to cassette. System specifications are closely tuned to applications, enabling faster and repeatable process results.
IntegraAC range of recondensing helium systems has been developed to reduce consumption of liquid helium. By recondensing helium gas evaporated within system, this minimises running costs and conserves this limited resource. It is also compatible with wide range of superconducting magnets.
Helium magnet system. Wide range of superconducting magnet systems up to 22 T, cooled by liquid helium. Ideal for highly vibration sensitive experiments.
Full featured video rate atomic force microscope. This high speed AFM allows researchers to measure nanoscale dynamic processes at video frame rates.
Configuration of Cypher ES AFM designed for polymer science research, comes standard with blueDrive photothermal excitation, three techniques from NanoMechPro toolbox for nanomechanical characterization, and high temperature polymer heater.
FlexAL systems provide newrange of flexibility and capability in engineering of nanoscale structures and devices by offering remote plasma atomic layer deposition processes and thermal ALD within single ALD systems.
Asylum Research Cypher ES builds on performance of Cypher S and adds full environmental control features. Same resolution, speed and stability are maintained while operating in controlled gas or liquid environments, at temperatures from 0 to 250 degrees C.
Uses remote source specifically designed for atomic scale processing. Has low damage for sensitive substrates, fast cycle times and reliablity with uniform plasma exposure and film deposition, short plasma times, 250ms, short strike time, 80ms, for high throughput, and reproducible strike time and low reflected power for high yield.
Olympus IX73 inverted microscope has been integrated into our IXplore systems. IXplore Systems are designed to provide solutions-based packages that suit your research application needs.