URL: https://www.kloe-france.com/en/laser-lithography/photolithography-systems/uv-exposure/uv-kub-2
Proper Citation: Kloe UV‑KUB 2 (RRID:SCR_021141)
Description: Compact exposure masking system is UV-LED masking system equipped with LED based optical head, collimated and homogeneous.One level mask aligner. Its masking function enables to reach resolutions less than 1um. This system is compatible with any of photoresists such as AZ series, Shipley series, SU-8 and K-CL series.
Synonyms: UV‑KUB 2 masking system, UV-KUB 2
Resource Type: instrument resource
Keywords: KLOE SA, UV LED masker, exposure masking system, instrument, equipment, USEDit
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