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URL: https://sro.txst.edu/sro-facilities/sro-nrsc/sro-nrsc-rtp.html
Proper Citation: Texas State University Rapid Thermal Annealer (RRID:SCR_028204)
Description: Fcility AGA Heatpulse 610 is a benchtop rapid thermal annealer (RTA/RTP) that utilizes high power lamps to heat treat thin films and substrates for processes such as contact formation, silicide formation, and dopant diffusion/activation. Temperature control via PID loop has a maximum heating rate of ~50 C/s and maximum temperature of 1000 C. The chamber can also be atmospheric purged with N2, Ar, 4% H2balAr, or O2. A rapid thermal processing system that enables fast heating and cooling cycles for semiconductor wafers, used for dopant activation, oxidation, and material modification.
Synonyms: Rapid Thermal Annealer (AS-One 150)
Resource Type: instrument resource
Keywords: rapid thermal annealing, RTA, semiconductor processing, thermal treatment, dopant activation
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