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URL: https://sro.txst.edu/sro-facilities/sro-nrsc/sro-nrsc-peald.html
Proper Citation: Texas State University PEALD System (RRID:SCR_028201)
Description: Facility plasma-enhanced atomic layer deposition (PEALD) system from Arradiance utilizes high-speed pulse valves to sequentially deliver reactants that combine to deposit thin films on the surface of a sample at temperatures up to 300C. Eight precursor positions (4 metalorganic + 4 oxidizer) and three plasma gases (N2, O2, H2) enable a wide range of films and process optimization. Plasma-enhanced atomic layer deposition system used for conformal, atomic-scale thin film growth with excellent uniformity and thickness control.
Synonyms: PEALD System (FlexAL-PEALD)
Resource Type: instrument resource
Keywords: PEALD, atomic layer deposition, thin films, plasma deposition, conformal coating,
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