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URL: https://sro.txst.edu/sro-facilities/sro-nrsc/sro-nrsc-pecvd.html
Proper Citation: Texas State University PECVD System (RRID:SCR_028202)
Description: Facility plasma-enhanced chemical vapor deposition (PECVD) system from AGS utilizes plasma decomposition of silane (SiH4) in in presence of an oxygen or nitrogen source to deposit SiO2 and Si3N4 dielectric thin films. The capacitive coupled plasma reduces the required temperature for deposition to a minimum of ~150degC. A plasma-enhanced chemical vapor deposition system is used to deposit high-quality thin films at reduced temperatures for semiconductor and materials applications.
Synonyms: , PECVD System (Versaline PECVD), Plasma-Enhanced Chemical Vapor Deposition system
Resource Type: instrument resource
Keywords: PECVD, plasma deposition, thin films, dielectric layers, semiconductor
Availability: Restricted
Resource Name: Texas State University PECVD System
Resource ID: SCR_028202
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Source: SciCrunch Registry (RRID:SCR_005400)
Description: Interactive portal for finding and submitting biomedical resources. Resources within SciCrunch have assigned RRIDs which are used to cite resources in scientific manuscripts. SciCrunch Registry, formerly NIF Registry, provides resources catalog. Allows to add new resources. Allows edit existing resources after registration. Curators are tasked with identifying and registering resources, examining data, writing configuration files to index and display data and keeping contents current.
URL: https://rrid.site/rin/sources/SCR_005400
The data sets included in this resource are published in Kravitz et al, 2012. Distinct roles for direct and indirect pathway striatal neurons in reinforcement (Nat. Neurosci).
