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URL: https://www.suss.com/brochures-datasheets/mask-aligner-ma-ba-6.pdf
Proper Citation: SUSS: MicroTek MA6/BA6 Mask Aligner (RRID:SCR_020533)
Description: MA/BA6 mask aligner is designed for all standard lithography applications and wafer sizes of up to 150 mm. For thick-resist MEMS applications, the MA/BA6 offers high resolution and optimum edge quality. The bottom side alignment option allows for pattern printing on both sides of the substrate. The MA/BA6 additionally provides tailored features for fragile III-V compounds, thinned or warped wafers, transparent substrates and pieces or single dies.
Resource Type: instrument resource
Keywords: SUSS Microtec, Mask Aligner, Instrument Equipment, USEDit
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Data set from Kravitz, Owen and Kretizer's 2012 paper "Optogenetic identification of striatal projection neuron subtypes during in vivo recordings."
