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URL: https://www.rigaku.com/products/optics/euv
Proper Citation: Rigaku: EUV Optics (RRID:SCR_020436)
Description: Multilayer optics for extreme UV lithography patterning of semiconductor wafers. High efficiency multilayer optics for 13.5 nm, 6.x nm wavelengths.
Resource Type: instrument resource
Keywords: Rigaku, X-Ray Optics, Instrument Equipment, USEDit,
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Source: SciCrunch Registry
Data set from Kravitz, Owen and Kretizer's 2012 paper "Optogenetic identification of striatal projection neuron subtypes during in vivo recordings."
